{"id":121,"date":"2025-02-16T10:40:53","date_gmt":"2025-02-16T09:40:53","guid":{"rendered":"https:\/\/atri2.mtf.stuba.sk\/?page_id=121"},"modified":"2025-02-16T10:40:53","modified_gmt":"2025-02-16T09:40:53","slug":"500-kv-ionovy-implantator","status":"publish","type":"page","link":"https:\/\/atri.mtf.stuba.sk\/?page_id=121","title":{"rendered":"500 kV i\u00f3nov\u00fd implant\u00e1tor"},"content":{"rendered":"

\"500kV<\/h3>\n

 <\/p>\n

I\u00f3nov\u00e1 implant\u00e1cia<\/span><\/h3>\n

I\u00f3nov\u00e1 implant\u00e1cia je proces, pri ktorom je substr\u00e1t bombardovan\u00fd ur\u00fdchlen\u00fdmi i\u00f3nmi pr\u00edmesi. Jej cie\u013eom je zabudovanie pr\u00edmesn\u00fdch at\u00f3mov do z\u00e1kladn\u00e9ho materi\u00e1lu vzorky. Zmenou energie implantovan\u00fdch i\u00f3nov sa men\u00ed h\u013abka zabudovania pr\u00edmesn\u00fdch at\u00f3mov. Kombin\u00e1ciou viacer\u00fdch energi\u00ed je mo\u017en\u00e9 docieli\u0165 po\u017eadovan\u00fd h\u013abkov\u00fd koncentra\u010dn\u00fd profil implantovan\u00e9ho prvku.<\/span><\/p>\n

Energetick\u00fd rozsah i\u00f3novej implant\u00e1cie je od 20\u00a0keV do 50 MeV. Maxim\u00e1lny priemer implantovan\u00e9ho substr\u00e1tu je 20 cm pre 500 kV implant\u00e1tor a\u00a010 cm pre 6 MV Tandetron. Implantovan\u00fd substr\u00e1t je mo\u017en\u00e9 chladi\u0165 vodou, kvapaln\u00fdm dus\u00edkom alebo vyhrieva\u0165.<\/span><\/p>\n

I\u00f3nov\u00e1 implant\u00e1cia je met\u00f3da vyu\u017e\u00edvaj\u00faca ur\u00fdchlen\u00e9 i\u00f3ny vhodn\u00e1 na vnesenie cudz\u00edch at\u00f3mov (vo forme i\u00f3nov) do z\u00e1kladn\u00e9ho materi\u00e1lu alebo na vytvorenie \u0161trukt\u00farnych por\u00fach v z\u00e1kladnom materi\u00e1li. T\u00fdmto sp\u00f4sobom m\u00f4\u017eeme cielene meni\u0165 z\u00e1kladn\u00e9 vlastnosti materi\u00e1lov. V princ\u00edpe je mo\u017en\u00e9 implantova\u0165 v\u0161etky chemick\u00e9 prvky vr\u00e1tane r\u00e1dioakt\u00edvnych izotopov. Materi\u00e1l, do ktor\u00e9ho chceme i\u00f3ny implantova\u0165, tzv. substr\u00e1t m\u00f4\u017ee by\u0165 z kovu, zliatiny, polovodi\u010da, keramiky \u010di plastu. Implant\u00e1cia r\u00e1dioakt\u00edvnych izotopov a n\u00e1sledn\u00e1 dvojdimenzion\u00e1lna detekcia kan\u00e1lovan\u00fdch a emitovan\u00fdch elektr\u00f3nov umo\u017e\u0148uje presn\u00e9 stanovenie umiestnenia ne\u010dist\u00f4t v mrie\u017eke monokry\u0161t\u00e1lov\u00fdch materi\u00e1loch. Technol\u00f3gie i\u00f3novej implant\u00e1cie sa vyu\u017e\u00edvaj\u00fa na dotovanie povrchov materi\u00e1lov za \u00fa\u010delom ochrany vo\u010di opotrebeniu, z\u00edskania antikor\u00f3znej ochrany alebo biokompatibiln\u00e9ho povrchu, zv\u00fd\u0161enie tvrdosti, cielen\u00e9ho nano\u0161trukt\u00farovania, dosiahnutia nanop\u00f3rovitosti, modifikovania elektrick\u00fdch, magnetick\u00fdch, fyzik\u00e1lnych \u010di chemick\u00fdch vlastnost\u00ed povrchov.<\/span><\/p>\n

Implant\u00e1cia kovov\u00fdch i\u00f3nov do dielektr\u00edk je progres\u00edvnou met\u00f3dou, ako z oby\u010dajn\u00e9ho objemov\u00e9ho materi\u00e1lu, ak\u00fdm je napr. sklo, keramika nebo polym\u00e9r, vytvori\u0165 materi\u00e1l s nov\u00fdmi netu\u0161en\u00fdmi vlastnos\u0165ami. Charakter a rozsah t\u00fdchto vlastnost\u00ed z\u00e1vis\u00ed od h\u013abky, v\u00a0ktorej s\u00fa i\u00f3ny naimplantovan\u00e9, od implanta\u010dnej d\u00e1vky, od h\u013abkov\u00e9ho profilu naimplantovan\u00fdch i\u00f3nov, a od vytvorenia pr\u00edpadn\u00fdch nano\u010dast\u00edc, dom\u00e9n \u010di nanovrstiev, ktor\u00e9 vznikaj\u00fa agreg\u00e1ciou i\u00f3nov, priebeh ktorej je podmienen\u00fd parametrami implant\u00e1cie (teplota, energia a n\u00e1boj implantovan\u00fdch i\u00f3nov). Tak napr\u00edklad i\u00f3ny Co alebo Fe implantovan\u00e9 do polym\u00e9rov \u010di skiel vytv\u00e1raj\u00fa kovov\u00e9 nano\u010dastice, ktor\u00fdch feroelektrick\u00e9 vlastnosti sa v\u00fdrazne l\u00ed\u0161ia od vlastnost\u00ed objemov\u00e9ho kovov\u00e9ho materi\u00e1lu; ich vyu\u017eitie sa predpoklad\u00e1 v spintronike. Skl\u00e1 implantovan\u00e9 Er sa vyu\u017e\u00edvaj\u00fa v laserovej a oznamovacej technike. Implant\u00e1cia Cu, Ag \u010di Au i\u00f3nov do skiel alebo polym\u00e9rov m\u00e1 za n\u00e1sledok r\u00f4zny stupe\u0148 optickej nelinearity materi\u00e1lu.<\/span><\/p>\n

Pomocou i\u00f3novej implant\u00e1cie je mo\u017en\u00e9 simulova\u0165 radia\u010dn\u00e9 po\u0161kodenie reaktorov\u00fdch ocel\u00ed. T\u00e1to met\u00f3da prin\u00e1\u0161a zna\u010dn\u00e9 v\u00fdhody, ako napr\u00edklad: o\u017eiaren\u00e9 vzorky nie s\u00fa r\u00e1dioakt\u00edvne a neexistuj\u00fa probl\u00e9my s manipul\u00e1ciou, meran\u00edm, upravovan\u00edm alebo skladovan\u00edm. Taktie\u017e neexistuje mo\u017enos\u0165 kontamin\u00e1cie okolit\u00e9ho prostredia alebo zariaden\u00ed. \u010cas o\u017earovania i\u00f3nmi je relat\u00edvne kr\u00e1tky, pri\u010dom ide o efekt\u00edvnu met\u00f3du pre \u0161t\u00fadium z\u00e1kladn\u00fdch efektov o\u017eiarenia materi\u00e1lu, ako je n\u00e1rast objemu, te\u010denie a segreg\u00e1cia chemick\u00fdch prvkom v materi\u00e1li.<\/span><\/p>\n

\u00a0Mie\u0161anie i\u00f3nov\u00fdm zv\u00e4zkom (Ion beam mixing)<\/span><\/h3>\n

Je premie\u0161avanie at\u00f3mov a\u00a0zlievanie v\u00a0mieste rozhrania dvoch r\u00f4znych materi\u00e1lov po\u010das o\u017earovania i\u00f3nmi. T\u00e1to met\u00f3da sa vyu\u017e\u00edva najm\u00e4 pri sp\u00e1jan\u00ed nerovnov\u00e1\u017enych a\u00a0metastabiln\u00fdch zliatin a\u00a0intermetalick\u00fdch zl\u00fa\u010den\u00edn.<\/span><\/p>\n

Aplik\u00e1cie i\u00f3novej implant\u00e1cie a\u00a0i\u00f3nov\u00e9ho mie\u0161ania<\/span><\/h3>\n

Hlavn\u00fdm cie\u013eom je zmena vlastnost\u00ed povrchov\u00fdch a\u00a0podpovrchov\u00fdch oblast\u00ed materi\u00e1lov. Popri tom, \u017ee implant\u00e1cia je jednou zo z\u00e1kladn\u00fdch technol\u00f3gi\u00ed polovodi\u010dov\u00e9ho priemyslu, vyu\u017e\u00edva sa aj na zv\u00fd\u0161enie odolnosti povrchov vo\u010di opotrebeniu, zv\u00fd\u0161enie tvrdosti, vytvorenie odolnosti vo\u010di oteru, antikor\u00f3znej ochrannej vrstvy, biokompatibiln\u00e9ho povrchu, ale sl\u00fa\u017ei aj na cielen\u00fa modifik\u00e1ciu elektrick\u00fdch, magnetick\u00fdch, optick\u00fdch aj \u010fal\u0161\u00edch fyzik\u00e1lnych alebo chemick\u00fdch vlastnost\u00ed povrchov\u00fdch vrstiev. Aktu\u00e1lnou aplika\u010dnou oblas\u0165ou je formovanie nano\u0161trukt\u00far, nanop\u00f3rovitosti a\u00a0modifik\u00e1cia ich vlastnost\u00ed.<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"

  I\u00f3nov\u00e1 implant\u00e1cia I\u00f3nov\u00e1 implant\u00e1cia je proces, pri ktorom je substr\u00e1t bombardovan\u00fd ur\u00fdchlen\u00fdmi i\u00f3nmi pr\u00edmesi. Jej cie\u013eom je zabudovanie pr\u00edmesn\u00fdch at\u00f3mov do z\u00e1kladn\u00e9ho materi\u00e1lu vzorky. Zmenou energie implantovan\u00fdch i\u00f3nov sa …<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":81,"menu_order":2,"comment_status":"closed","ping_status":"closed","template":"template-fullwidth.php","meta":{"_eb_attr":"","footnotes":""},"class_list":["post-121","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/pages\/121","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=121"}],"version-history":[{"count":2,"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/pages\/121\/revisions"}],"predecessor-version":[{"id":992,"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/pages\/121\/revisions\/992"}],"up":[{"embeddable":true,"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=\/wp\/v2\/pages\/81"}],"wp:attachment":[{"href":"https:\/\/atri.mtf.stuba.sk\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=121"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}