Department of Ion-Beam Technologies

The Science Centre of Materials Research represents a science and research basis for the application of the ion and plasma technologies in the physical and material engineering and in nanotechnologies. It is equipped with the top technologies for the modification and analysis of the subsurface and thin layers of solid substances by using the effect of accelerated ions and plasma.

The Centre of Materials Research comprises:

  • laboratory of ion beam technology that deals with the use of accelerated ions for the synthesis, modification and analysis of materials. The Workplace is targeted at on the use of accelerated ions for synthesis, modification and analysis of materials. There are two key devices: 6 MV Tandetron – a linear tandem ion accelerator, and a 500 kV ion implanter. Accelerating voltage of Tandetron is from 300 kV, that of the implanter from 20 kV. They make it possible to accelerate almost all elements, starting from hydrogen up to gold, except for inert gases. The total achievable energy range of accelerated ions of the two devices represents the interval from 10 keV up to 50 MeV. The maximum achievable power is 12 MeV for hydrogen, 18 MeV for helium and 50 MeV for heavy elements such as gold. Transport of ion beam and the experiments are performed in the experimental chambers in a high vacuum.
  • ion beam analysis laboratory that deals with the interaction of accel-erated ions with atoms of hit sample leads to several physical phenomena. Depending on the layout and geometry of the experiment, and on which interaction product isdetected, we can utilize a variety of ion beam based analytical methods. Depending on which component of the result of the interaction emitted from the sample is detected, we perform the following analyticalmethods:

    • RBS - Rutherford Backscattering Spectrometry

    • channeling or RBS/C

    • ERDA - Elastic Recoil Detection Analysis

    • PIXE - Particle Induced X-ray Emission

    • NRA - Nuclear Reaction Analysis

  • laboratory of plasmatic modification and deposition focuses of plasma technologies and the investigation of plasma parameters in the treatment of surface layers of materials. Workspace equipment is based on magnetron sputtering and plasma-supported ion implantation (PIII).


Advanced Technologies Research Institute
Faculty of Materials Science and Technology in Trnava
Slovak University of Technology in Bratislava
Jána Bottu 8857/25
917 24 Trnava
GPS:  48.37088 17.572509

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